Langdao Silex shows prototype EUV light source in Shanghai
The demo points to a domestic EUV supply chain, but commercial use is still years away.
Chinese startup Langdao Silex showed a prototype EUV light source at the 26th China International Industry Fair in Shanghai, a step that matters because China is still trying to build local alternatives to ASML-supplied lithography tools. The company says its FlintNano LPP-OXXO source exceeds 15W of EUV output, uses 90% domestic components, and can run continuously for more than 100 hours with 3% RMS plasma stability and 5% EUV power stability. TrendForce, citing sources, says Langdao will need another three to five years to commercialize the technology. Langdao is also working on a higher-power FlintMicro-LPP source that has completed proof-of-principle validation, but it has not disclosed its power, efficiency, or lifetime.
Why it matters
For China’s chip industry, the prototype suggests progress toward a local alternative to imported lithography tools, but it is not yet a production-ready option. The company still needs years to commercialize it, and the higher-power follow-on source remains at an early validation stage with key specifications undisclosed.
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Sources
- Tom's Hardware